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13 September 2006
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III. MICROWAVE PLASMA APPLICATION
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| 1. |
T.A. Grotjohn, J. Narendra, J. Zhang, J. Asmussen and N. Xi
(Michigan State University and Fraunhofer Center for Coatings and Laser
Applications, East Lansing, MI 48824, USA)
Miniature microwave plasma discharge for local area materials
processing.
(22 kb)
(plenary)
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| 2. |
H. Sugai, Y. Nojiri, Y. Hotta, T. Ishijima, H. Toyoda, A. Masuda*,
M. Kondo*
(Department of Electrical Engineering and Computer Science, Nagoya University
Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan,
*Research Center for Photovoltaics, National Institute of Advanced
Industrial Science and Technology, Tsukuba, Ibaraki, 305-8568, Japan)
Slot-excited surface wave plasma for giant scale processing.
(23 kb)
(plenary)
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| 3. |
Y. Kabouzi, M. Nantel-Valiquette, K. Makasheva, E. Castaños-Martinez,
M. Moisan, J.-C. Rostaing*
(Groupe de physique des plasmas, Université de Montréal,
Montréal, Québec, *Air Liquide,
Recherche et développement, Les Loges-en-Josas, France)
Reduction of PFC emissions using atmospheric-pressure
microwave plasmas: mechanisms and energy efficiency.
(23 kb)
(plenary)
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| 4. |
J. Pollak, M. Moisan, Z. Zakrzewski*
(Groupe de physique des plasmas, Université de Montréal,
Montréal, Québec,
*Polish Academy of Sciences, Gdańsk, Poland)
RF and microwave plasma sources using linear-field-applicators
based on stripline technology.
(22 kb)
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| 5. |
E.M. Barkhudarov, M.A. Misakyan, I.A. Kossyi, V.A. Kiselev*,
I.M. Taktakishvili, A.V. Tulupov*
(General Physics Institute of Russian Academy of Sciences, Moscow, Russia,
*"SOLITON-NTT" Co. Ltd., Moscow, Russia)
Microwave ultraviolet lamp.
(26 kb)
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| 6. |
M. Kando, Y. Ohishi* and T. Mizojiri
(Graduate School of Electronic Science and Technology, Shizuoka University,
Hamamatsu, Japan,
*Graduate School of Science and Engineering, Shizuoka University,
Hamamatsu, Japan)
Properties of high-pressure microwave discharge lamp
ignited by antenna effects.
(23 kb)
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| 7. |
V.A. Koldanov, A.L. Vikharev, A.M. Gorbachev, A.B. Muchnikov, D.B. Radishev
(Institute of Applied Physics, Nizhny Novgorod, Russia)
Diamond films growth in pulsed MPACVD reactor.
(22 kb)
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| 8. |
S. Shapoval, A. Kovalchuk, V. Zemljakov*, V. Sirotkin
(Institute of Microelectronics Technology RAS, 142432 Chernogolovka,
Moscow region, Russia,
*R&D Corporation "Istok", Fryazino, Moscow region, Russia)
Passivation of the AlxGayN/GaN heterostructure by
nano-crystalline GaN submicron film deposited in condition of electron
cyclotron resonance plasma.
(22 kb)
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| 9. |
S. Shapoval, V. Borodin*, V. Gorbunov*
and A. Veretennikov*
(Institute of Microelectronics Technology RAS, Chernogolovka,
Moscow region, 142432 Russia,
*Experimental Factory for Scientific Engineering RAS (EZAN),
Chernogolovka, Moscow region, 142432 Russia)
ECR-plasma application for nanotechnology.
(22 kb)
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| 10. |
S. Gritsinin, V. Knyazev, I. Kossyi, Yu. Shikhman*,
V. Vinigradov*
(Prokhorov Institute of General Physics, Moscow, Russia,
*Central Institute of Aviation Motors, Moscow, Russia)
Microwave torch application for kerosene - air mixture ignition.
(21 kb)
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| 11. |
A.M. Gorbachev, A.B. Muchnikov, A.L. Vikharev, D.B. Radishev, V.A. Koldanov
(Institute of Applied Physics RAS, Nizhny Novgorod, Russia)
Hydrocarbon kinetics during CVD diamond growth.
(20 kb)
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| 12. |
M. Kral, A. Ogino*, K. Narushima**, M. Yamashita*
and M. Nagatsu*
(Graduate School of Electronic Science and Technology, Shizuoka University,
Hamamatsu, Japan,
*Graduate School of Science and Technology, Shizuoka University,
Hamamatsu, Japan,
**Faculty of Engineering, Shizuoka University, Hamamatsu, Japan)
Low-temperature chemical modification of polymer surfaces
using surface-wave plasma.
(23 kb)
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| 13. |
M. Nagatsu, T. Tanaka*, T. Matsuda*, M. Marcel and A. Ogino
(Graduate School of Science and Technology, Shizuoka University, Hamamatsu,
Japan,
*Graduate School of Science and Technology, Shizuoka University,
Hamamatsu, Japan)
Low-temperature growth of carbon nanotubes using ion-assisted
surface-wave plasma.
(21 kb)
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| 14. |
L. Xu, H. Zhou*, A. Ogino**, Y. Koide*** and
M. Nagatsu**
(Graduate School of Electronic Science and Technology, Shizuoka University,
Hamamatsu, Japan,
*Innovative Joint Research Center, Shizuoka University, Hamamatsu,
Japan,
**Graduate School of Science and Technology, Shizuoka University,
Hamamatsu, Japan,
***Department of Microbiology and Immunology, Hamamatsu University
School of Medicine, Hamamatsu, Japan)
Internal sterilization of wrapped medical implements using
volume-wave plasma.
(22 kb)
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